Joachim N. Burghartz, Yuh-Jier Mii
IEEE Electron Device Letters
Silicon-Germanium (SiGe) power heterojunction bipolar transistors (HBT's) are fabricated by using two or ten device unit cells with an emitter area of 5 × 0.5 × 16.5 μm 2 each. The large power transistor features 1 W rf output power at 3-dB gain compression, 3.5 V bias, and 2.4 GHz with a maximum power-added-efficiency (PAE) of 48% for Class A/B operation. At a supply voltage of 1.5 V, the transistor delivers a 3-dB rf output power of 150 mW with a PAE of 47%. It is shown that a high collector doping level is advantageous for low-voltage operation. Further, by using special bias sense ports, the interconnect losses are found to degrade the device performance to a considerable degree.
Joachim N. Burghartz, Yuh-Jier Mii
IEEE Electron Device Letters
Daeik D. Kim, Ongyeun Cho, et al.
CICC 2008
Phillip J. Restle, Craig A. Carter, et al.
ISSCC 2002
Joachim N. Burghartz, D. Edelstein, et al.
IEEE Journal of Solid-State Circuits