Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We continue the study of complexity classes over the weak model introduced by P. Koiran. In particular we provide several separations of complexity classes, the most remarkable being the strict inclusion of P in NP. Other separations concern classes defined by weak polynomial time over parallel or alternating machines as well as over nondeterministic machines whose guesses are required to be 0 or 1. © 1994.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Charles H. Bennett, Aram W. Harrow, et al.
IEEE Trans. Inf. Theory
Fan Zhang, Junwei Cao, et al.
IEEE TETC
Thomas M. Cheng
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