Application of atomic-force microscopy to phase-shift masks
A.P. Ghosh, D.B. Dove, et al.
Microlithography 1992
Interferometric near-field optical microscopy achieving a resolution of 10 angstroms is demonstrated. The scattered electric field variation caused by a vibrating probe tip in close proximity to a sample surface is measured by encoding it as a modulation in the optical phase of one arm of an interferometer. Unlike in regular near-field optical microscopes, where the contrast results from a weak source (or aperture) dipole interacting with the polarizability of the sample, the present form of imaging relies on a fundamentally different contrast mechanism: sensing the dipole-dipole coupling of two externally driven dipoles (the tip and sample dipoles) as their spacing is modulated.
A.P. Ghosh, D.B. Dove, et al.
Microlithography 1992
C.C. Williams, H.K. Wickramasinghe
Journal of Applied Physics
Philip C. D. Hobbs, David W. Abraham, et al.
Applied Physics Letters
M. Nonnenmacher, M. Vaez-Iravani, et al.
Review of Scientific Instruments