Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We present a method for mitigating measurement errors on quantum computing platforms that does not form the full assignment matrix, or its inverse, and works in a subspace defined by the noisy input bit strings. This method accommodates both uncorrelated and correlated errors and allows for the computation of accurate error bounds. Additionally, we detail a matrix-free preconditioned iterative-solution method that converges in O(1) steps that is performant and uses orders of magnitude less memory than direct factorization. We demonstrate the validity of our method and mitigate errors in a few seconds on numbers of qubits that would otherwise be impractical.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007
Juliann Opitz, Robert D. Allen, et al.
Microlithography 1998
Paul J. Steinhardt, P. Chaudhari
Journal of Computational Physics