Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper describes a clustered multiprocessor system developed for the general-purpose, large-scale commercial marketplace. The system (S/390® Parallel Sysplex™) is based on an architecture designed to combine the benefits of full data sharing and parallel processing in a highly scalable clustered computing environment. The Parallel Sysplex offers significant advantages in the areas of cost, performance range, and availability.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Frank R. Libsch, S.C. Lien
IBM J. Res. Dev
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998
Marshall W. Bern, Howard J. Karloff, et al.
Theoretical Computer Science