PaperKinetic model for the chemical vapor deposition of tungsten in the silane reduction processJulian J. HsiehJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperGrowth and transport properties of multilayer superconducting films of Nd1.83Ce0.17CuOx / YBa2Cu3O7-δA. Gupta, R. Gross, et al.SPIE Advances in Semiconductors and Superconductors 1990
PaperDirected assembly of lamellae-forming block copolymers by using chemically and topographically patterned substratesSang-Min Park, Mark P. Stoykovich, et al.Advanced Materials
PaperSilylation of resist materials using di- and polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.Microelectronic Engineering
