Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A powerful technique is described for optimizing electromagnetic codes that involve the boundary element method and nonlinear eigenvalue problems. It is specifically adapted to an algorithm that handles propagation in periodic structures and replaces the standard determinant search and linear equation solution subroutines. Through mechanical speedup and improved numerical convergence, the run time for large cases is reduced by an order of magnitude. Details of technique, the electromagnetic algorithm, and numerical studies are presented. © 1995 by Academic Press, Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Quantum Machine Intelligence
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