Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
Using an advanced reflection high energy electron diffraction (RHEED) system we found oscillations of the in-plane lattice spacing on the monolayer scale during deposition of Co on Cu(001) [J. Fassbender et al., Phys. Rev. Lett. 75 (1995) 4476]. Here we present in detail the influence of the deposition rate on these oscillations and therefore on the growth process. With increasing deposition rate an enhanced variation of the in-plane lattice spacing occurs which is interpreted as a transition from a layer-by-layer to a more three-dimensional growth mode only for the first two monolayers. An unexpected linear behavior between the deposition rate and the maximum in-plane relaxation is found.
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Julien Autebert, Aditya Kashyap, et al.
Langmuir
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials