K.N. Tu
Materials Science and Engineering: A
Measurements of the rf electric field dependence of the amplitude of the "memory" echo in LiNbO3 and GaAs powders are reported. Consistent with the torque-rotation model, the dependence on each of the three applied rf pulses is linear in the low power regime. At high power, more complex behavior is found including an irreversible decrease in the echo amplitude when the third applied pulse is larger than the preceeding two pulses. © 1978.
K.N. Tu
Materials Science and Engineering: A
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications