Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
We present a corollary to Washburn's equation in capillary dynamics. We show that, during capillary filling, in cases where flow path decreases with time, an accelerating capillary flow or reverse-Washburn flow regime occurs. We provide a description of this phenomenon following Washburn's classic analysis and characterize a “reverse-Washburn” capillary flow regime in both inertial and viscous regimes. This regime is observed and characterized in experiments and numerical simulations of recently discovered self-coalescence flows, opening the door to engineering devices with naturally accelerating capillary inflows.
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
A. Gangulee, F.M. D'Heurle
Thin Solid Films
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
T.N. Morgan
Semiconductor Science and Technology