R. Sooriyakumaran, D. Fenzel-Alexander, et al.
Microlithography 2000
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
R. Sooriyakumaran, D. Fenzel-Alexander, et al.
Microlithography 2000
R.D. Allen, I.Y. Wan, et al.
J. Photopolym. Sci. Tech.
R.D. Allen, G.M. Wallraff, et al.
ACS Spring 1991
Carl E. Larson, G.M. Wallraff, et al.
Microlithography 2004