Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Shu Tezuka
WSC 1991
Da-Ke He, Ashish Jagmohan, et al.
ISIT 2007
Andrew Skumanich
SPIE Optics Quebec 1993