Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
Conference paperIntegration of polymer self-assembly for lithographic applicationJoy Y. Cheng, Daniel P. Sanders, et al.SPIE Advanced Lithography 2008
Conference paperEXAMPLES OF USING THE RESEARCH QUEUEING PACKAGE MODELING ENVIRONMENT (RESQME).Robert F. Gordon, Edward A. MacNair, et al.WSC 1985
Conference paperChanges of Tc under epitaxial strain: Implications for the mechanism of superconductivityJ.P. Locquet, J. Perret, et al.SPIE Optical Science, Engineering, and Instrumentation 1998
