Hiroshi Ito, Reinhold Schwalm
JES
A phenomenological explanation of Raman scattering in amorphous Si, Ge and III-V semiconductors is given, using Si as an example. Several applications of Raman scattering to the study of amorphous materials are discussed. © 1972.
Hiroshi Ito, Reinhold Schwalm
JES
T. Schneider, E. Stoll
Physical Review B
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Journal of Rheology
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Inorganic Chemistry