P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Analogues of poly(methyl methacrylate) (PMMA) incorporating halogen atoms in the α-position or in the ester side group have recently attracted much attention as sensitive electron-beam positive resists. Ito et al. have reported that methyl α-(trifluoromethyl)acrylate(MTFMA) does not undergo radical homopolymerization but readily polymerizes bypyridine initiation due to the low electron density on the double bond. © 1984, American Chemical Society. All rights reserved.
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A. Gangulee, F.M. D'Heurle
Thin Solid Films
K.N. Tu
Materials Science and Engineering: A
Mark W. Dowley
Solid State Communications