Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The propagation of light through an aperture scanning near-field optical microscope is studied. Rules for optimizing the confinement and throughput of aperture near-field probes are derived. The radiation from the aperture through simple sample structures, a flat substrate and a substrate with stripe-like elevations and depression, into classically allowed and forbidden directions is determined quantitatively. It is shown that small amplitude and phase objects can be distinguished by comparing "allowed" and "forbidden" light images.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
R.W. Gammon, E. Courtens, et al.
Physical Review B
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry