M.A. Lutz, R.M. Feenstra, et al.
Surface Science
Photoemission secondary-electron energy distributions and yield measurements for (100) EuO show that "quasielastic" rather than inelastic electron scattering dominates the photoemission escape process for electrons excited within a few eV of threshold. In this "quasielastic" scattering regime (with a large effective escape depth ∼ 50-100), it is suggested that the spin polarization need not be conserved in the photoemission escape process, and that reported "paramagnetic" spin-polarized photoemission at 10 °K is possibly due to quasielastic spin-flip scattering. © 1973 The American Physical Society.
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
M. Hargrove, S.W. Crowder, et al.
IEDM 1998
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures