Conference paper
Characterization of line width variation
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
No abstract available.
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
Andrew Skumanich
SPIE Optics Quebec 1993
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007