Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper studies batch arrival MX/G/1 priority queues without and with (multiple or single) vacations. Applying the delay busy cycle analysis, we explicity derive the Laplace-Stieltjes transforms and the first two moments of the waiting time distributions for the nonpreemptive (head-of-the-line) and preemptive resume priority queues. Conservation laws for batch arrival systems are also mentioned. The results in this paper cover many previous results as special cases. © 1991.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Jianke Yang, Robin Walters, et al.
ICML 2023