American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Paper

01 Aug 1996

Preparation of lithographic resist materials by anionic polymerization

Paper

Thermally Developable, Positive Resist Systems with High Sensitivity

Hiroshi Ito, Reinhold Schwalm

JES

Conference paper

Aqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors

Hiroshi Ito

Proceedings of SPIE 1989

Paper

Penultimate effect in radical copolymerization of 2- trifluoromethylacrylates

Hiroshi Ito, Brian C. Trinque, et al.

J Polym Sci Part A

Paper

Chemical amplification resists: Inception, implementation in device manufacture, and new developments

Hiroshi Ito

J Polym Sci Part A

View all publications