H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Paper
Pitting of Sputtered Aluminum Alloy Thin Films
Abstract
A number of Al binary alloy thin films were studied over a range of composition up to 40% solute using a co-sputtering technique with the substrates at room temperature. These Al alloy films were tested in 0.1 M NaCl and found to have extraordinary pitting resistance. © 1989, The Electrochemical Society, Inc. All rights reserved.
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