Zohar Feldman, Avishai Mandelbaum
WSC 2010
No abstract available.
Zohar Feldman, Avishai Mandelbaum
WSC 2010
S. Sattanathan, N.C. Narendra, et al.
CONTEXT 2005
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Khaled A.S. Abdel-Ghaffar
IEEE Trans. Inf. Theory