Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The design, construction and performance of an eyetracker is discussed. The device provides real-time signals giving the direction of a user's gaze, with a precision of 0.3 degrees of arc and an update time of 17 ms. It is usable by a wide range of subjects in normal office-type conditions. © 1984.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Rafae Bhatti, Elisa Bertino, et al.
Communications of the ACM
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Thomas M. Cheng
IT Professional