Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We conduct Monte Carlo simulations to analyze the percolation transition of a nonsymmetric loop model on a regular three-dimensional lattice. We calculate the critical exponents for the percolation transition of this model. The percolation transition occurs at a temperature that is close to, but not exactly, the thermal critical temperature. Our finite-size study on this model yields a correlation length exponent that agrees with that of the three-dimensional XY model with an error margin of 6%.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
K.A. Chao
Physical Review B
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures