Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We exhibit an interpolation process using rational functions which is stable - in the strict sense of Fejer - for all sets of nodes and is optimal, insofar as the degree of the interpolating rational function is concerned. The degree of approximation to continuous functions by this procedure is also determined. © R. Oldenbourg Verlag
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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