Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Given ζ ∈ (-1, 0), n ∈ N, we discuss the optimal recovery of f{hook} (ζ), for f{hook} analytic and bounded in . |Z|&<1 < 1, from the knowledge of the values of f{hook} at n points z1,.zm∈[0,l), where these points are chosen to produce the least possible intrinsic error. The optimal algorithms are explicitly determined. © 1983 Academic Press Inc. (London) Limited.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Peter Wendt
Electronic Imaging: Advanced Devices and Systems 1990
Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings