Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Given ζ ∈ (-1, 0), n ∈ N, we discuss the optimal recovery of f{hook} (ζ), for f{hook} analytic and bounded in . |Z|&<1 < 1, from the knowledge of the values of f{hook} at n points z1,.zm∈[0,l), where these points are chosen to produce the least possible intrinsic error. The optimal algorithms are explicitly determined. © 1983 Academic Press Inc. (London) Limited.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John S. Lew
Mathematical Biosciences
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002