R. Srinivasan, R.J. von Gutfeld, et al.
Chemical Physics Letters
The techniques of optical emission spectroscopy with actinome-try, laser induced fluorescence spectroscopy, laser optogalvanic spectroscopy and absorption spectroscopy are discussed. Examples of the application of these techniques to probing low pressure plasmas of the type used in microelectronics materials processing are presented. © 1985 IUPAC
R. Srinivasan, R.J. von Gutfeld, et al.
Chemical Physics Letters
R.W. Dreyfus, A.S. Nowick
Journal of Applied Physics
R.J. Von Gutfeld, F.Alan McDonald, et al.
Applied Physics Letters
J.W. Lyding, T.-C. Shen, et al.
Israel Journal of Chemistry