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The techniques of optical emission spectroscopy with actinome-try, laser induced fluorescence spectroscopy, laser optogalvanic spectroscopy and absorption spectroscopy are discussed. Examples of the application of these techniques to probing low pressure plasmas of the type used in microelectronics materials processing are presented. © 1985 IUPAC
J.H. Glownia, D.R. Gnass, et al.
Journal of Chemical Physics
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