I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
We describe how the unique capabilities of molecular beam epitaxy together with the electron-beam lithography and reactive-ion etching can be utilized to realize novel quasi-one- and zero-dimensional electron systems. We also present the results of capacitive and tunneling studies on these quantum systems. © 1989.
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
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IEEE T-MTT
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter
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Journal of Polymer Science Part A: Polymer Chemistry