Conference paper
Intensive optimization of masks and sources for 22nm lithography
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
We further study some known families of valid inequalities for the 2-edge-connected and 2-node-connected subgraph polytopes. For the 2-edge-connected case, we show that the odd wheel inequalities together with the obvious constraints give a complete description of the polytope for Halin graphs. For 2-node-connected subgraphs, we show that the inequalities above, plus the partition inequalities, describe the polytope for the same class of graphs. © 1995.
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
Francisco Barahona, Markus Ettl, et al.
WSC 2013
Mourad Baiou, Francisco Barahona
Mathematical Programming
Mourad Baïou, Francisco Barahona, et al.
Mathematics of Operations Research