Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization
Alfonso P. Cardenas, Larry F. Bowman, et al.
ACM Annual Conference 1975
B. Wagle
EJOR