Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We find the minimum distances of the binary (113,57), and ternary (37,19), (61,31), (71,36), and (73,37) quadratic residue codes and the corresponding extended codes. These distances are 15, 10, 11, 17, and 17, respectively, for the nonextended codes and are increased by one for the respective extended codes. We also characterize the minimum weight codewords for the (113,57) binary code and its extended counterpart. © 1984 IEEE
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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