Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
It is shown that, under certain conditions, orthonormalizing the positive integer shifts of an exponentially decaying function on the half line by the Gram-Schmidt process leads to a limiting profile given by orthonormalizing all their integer shifts on the whole line. These results derive from properties of Cholesky factorization of bi-infinite and semi-infinite matrices. An example is provided by the negative exponential function and conjectures are given, supported by numerical evidence, for the Gaussian and Lorentz function.
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
David Cash, Dennis Hofheinz, et al.
Journal of Cryptology