Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Paper
On the existence of generally convergent algorithms
Abstract
No abstract available.
Related
Conference paper
Single and dual wavelength exposure of photoresist
J. LaRue, C. Ting
Proceedings of SPIE 1989
Zhihua Xiong, Yixin Xu, et al.
International Journal of Modelling, Identification and Control
Conference paper
Optimization of real phase-mask performance
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991