Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Given a graph G, let λ (G) denote the largest eigenvalue of the adjacency matrix of G. We prove that for any λ ≥ 2+ 5 ( = 2.058+) there exists a sequence of graphs G1,G2,... such that limk→∞λ(Gk) = λ, thus answering a question posed by Hoffman. © 1989.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Heng Cao, Haifeng Xi, et al.
WSC 2003
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Mathematics of Computation
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IEEE International Symposium on Information Theory - Proceedings