Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We prove a monotone interpolation property for split cuts which, together with results from Pudlák (1997) [20], implies that cutting-plane proofs which use split cuts (or, equivalently, mixed-integer rounding cuts or Gomory mixed-integer cuts) have exponential length in the worst case. © 2009 Elsevier B.V.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A. Skumanich
SPIE OE/LASE 1992
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Ziv Bar-Yossef, T.S. Jayram, et al.
Journal of Computer and System Sciences