Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We show that for every n > 2 the standard n th-order approximation Rn(D), to the rate-distortion function of the binary-symmetric Markov source (BSMS) is not successively refineable under the Hamming distortion measure in an open interval of the form Dn<D<1/2=Dmax. © 2006 IEEE.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Matthias Kaiserswerth
IEEE/ACM Transactions on Networking
Oliver Bodemer
IBM J. Res. Dev
Gal Badishi, Idit Keidar, et al.
IEEE TDSC