Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We give a numerical criterion for a badly conditioned zero of a system of analytic equations to be part of a cluster of two zeros.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007