Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Let A=(aij) be a real symmetric matrix of order n. We characterize all nonnegative vectors x=(x1,...,xn) and y=(y1,...,yn) such that any real symmetric matrix B=(bij), with bij=aij, i≠jhas its eigenvalues in the union of the intervals [bij-yi, bij+ xi]. Moreover, given such a set of intervals, we derive better bounds for the eigenvalues of B using the 2n quantities {bii-y, bii+xi}, i=1,..., n. © 1981.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Salvatore Certo, Anh Pham, et al.
Quantum Machine Intelligence
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
John R. Kender, Rick Kjeldsen
IEEE Transactions on Pattern Analysis and Machine Intelligence