Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We show how clique and cover induced inequalities implied from 0-1 knapsack constraints can be obtained as Chvatal-Gomory inequalities. LP tighter and 0-1 equivalent constraints to 0-1 knapsack constraints obtained by the 'big M' reduction procedure can also be generated as Chvatal-Gomory inequalities. We also show how some extended coefficient reduction based LP tighter and 0-1 equivalent constraints can be generated as Gomory fractional cuts. © 1994.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Hendrik F. Hamann
InterPACK 2013
Thomas M. Cover
IEEE Trans. Inf. Theory
György E. Révész
Theoretical Computer Science