Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A method is proposed for removing the "muffin-tin" restriction from the Green's function or the Korringa-Kohn-Rostoker method of band calculation and, more generally, from multiple-scattering theory as formulated by Beeby and Edwards. The method is applied to a model for crystalline silicon involving a single parameter which is adjusted to reproduce the experimental indirect gap. The numerical results are in good agreement with a large number of experiments and in particular support the view that the Δ axis is important to the reflectivity peak at 3.4 eV. (The energy separation Γ15-Γ25′ is found to be 3.04 eV.) © 1970 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Robert W. Keyes
Physical Review B
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering