Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Exposure of positive-type polyimide (PI) to linearly polarized deep UV (DUV) light (257nm) induced homogeneous alignment of nematic liquid crystals. The alignment state changed markedly at a particular energy of the UV light. Measurement of the UV absorption spectrum and retardation change generated in PI films by UV irradiation showed that anisotropic alignment was caused by a new mechanism, photodepolymerization of polyimide main chains parallel to the electric field of the DUV light.
We induced nematic monodomain homogeneous alignment by exposing positive-type PI to linearly polarized DUV light. The alignment direction was perpendicular to the electric field of the DUV, and its condition suddenly changed at 7J/cm2. We explained this phenomenon as resulting from a new mechanism, anisotropic photodepolymerization of PI. © 1995, The Society of Photopolymer Science and Technology(SPST). All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
R.W. Gammon, E. Courtens, et al.
Physical Review B
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997