Hiroshi Ito, Reinhold Schwalm
JES
A report on the progress in nanofabrication technology was presented. The principles and limits of the various pattern formation techniques which have emerged as important tools in the research nanoscale devices and structures were discussed. Topics such as electron beam lithography, imprint lithography, proximal probes and self assembly were also discussed.
Hiroshi Ito, Reinhold Schwalm
JES
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Robert W. Keyes
Physical Review B
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008