Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Systems of difference equations containing small parameters are studied by a constructive perturbation scheme analogous to the one developed by the authors for the study of differential equations. The method results in an averaging procedure for difference equations, and it is particularly well suited to certain highly oscillatory, nonlinear systems. The method is applied to problems from population genetics, pattern recognition, and the numerical analysis of stiff differential equations.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Heng Cao, Haifeng Xi, et al.
WSC 2003
Heinz Koeppl, Marc Hafner, et al.
BMC Bioinformatics
Karthik Visweswariah, Sanjeev Kulkarni, et al.
IEEE International Symposium on Information Theory - Proceedings