Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Using the conventional drift-diffusion model, multiple steady state solutions are constructed for a PNPN-junction structure using a combination of numerical and asymptotic techniques. We assume constant mobilities and a piecewise constant doping profile. © 1989.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Igor Devetak, Andreas Winter
ISIT 2003
Shu Tezuka
WSC 1991
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering