Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
A field effect transistor device (FET), consisting of a nonlinear Mott Insulator channel material, and a high dielectric-constant gate oxide, is explored as a nanoscale device. Experimental functionality of a large scale prototype (5 μm channel length) has been demonstrated. The underlying physics of the device is analyzed and modeled using a time-dependent Hartree approach. Timing estimates suggest a relatively short switching time.
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Ellen J. Yoffa, David Adler
Physical Review B
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010