Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The majority-rule, block-spin, renormalization-group transformation for the d=3 Ising model is studied, with the use of a recently developed technique for calculating renormalized coupling parameters from a single Monte Carlo simulation. Renormalization-group trajectories and the approximate fixed point are calculated. Improvements in the convergence of the Monte Carlo renormalization-group calculations of critical exponents are discussed. © 1984 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ronald Troutman
Synthetic Metals
R. Ghez, J.S. Lew
Journal of Crystal Growth
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics