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Modeling polarization for Hyper-NA lithography tools and masks
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We consider offline algorithms for minimizing the total flow time on O(1) machines where jobs can be preempted arbitrarily but migrations are disallowed. Our main result is a quasi-polynomial time approximation scheme for minimizing the total flow time. We also consider more general settings and give some hardness results. © 2004 Elsevier B.V. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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