Mechanisms of atomic ion emission during sputtering

Several major experimental and theoretical findings made in the last few years on the mechanisms of secondary ion emission are summarized. There is a strong indication that the phenomena can be divided into two categories: Ion emission from the surfaces of metals and semiconductors tends to have a strong correlation with the work function and can be described quite well with an electron tunneling model. Ion emission from systems which show large chemical enhancement has only a weak correlation with global surface properties like the work function or the bandgap. Instead it seems to be related more to local chemical bonds and coordination numbers. A localized bond breaking picture may be more appropriate in these circumstances. © 1986.