Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Proton-induced X-rays have been used for the measurement of mass absorption coefficients in the 0.1 to 1 keV energy range. In this technique the absorbing film is supported directly on a substrate which under proton bombardment will generate the characteristic substrate radiation whose absorption in the film will be measured. Results are given for twelve different metals at the B K alpha (184 eV) line.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
P. Alnot, D.J. Auerbach, et al.
Surface Science