Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We present a new method for accelerating matrix multiplication asymptotically. Thiswork builds on recent ideas of Volker Strassen, by using a basic trilinear form which is not a matrix product. We make novel use of the Salem-Spencer Theorem, which gives a fairly dense set of integers with no three-term arithmetic progression. Our resulting matrix exponent is 2.376. © 1990, Academic Press Limited. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
John A. Hoffnagle, William D. Hinsberg, et al.
Microlithography 2003
Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering